Special Section on Nanophotonics and Plasmonics for Solar Energy Harvesting and Conversion

Plasma etching antireflection nanostructures on optical elements in concentrator photovoltaic systems

[+] Author Affiliations
Efrain Eduardo Tamayo Ruiz

University of Tokyo, Research Center for Advanced Science and Technology (RCAST), Meguro-ku, Tokyo 153-8904, Japan

University of Tokyo, School of Engineering, Bunkyo-ku, Tokyo 113-8656, Japan

Kentaroh Watanabe, Ryo Tamaki, Kenjiro Miyano

University of Tokyo, Research Center for Advanced Science and Technology (RCAST), Meguro-ku, Tokyo 153-8904, Japan

Takuya Hoshii, Yoshitaka Okada

University of Tokyo, Research Center for Advanced Science and Technology (RCAST), Meguro-ku, Tokyo 153-8904, Japan

University of Tokyo, School of Engineering, Bunkyo-ku, Tokyo 113-8656, Japan

Masakazu Sugiyama

University of Tokyo, School of Engineering, Bunkyo-ku, Tokyo 113-8656, Japan

Aleksandra Cvetkovic, Rubén Mohedano, Maikel Hernandez

LPI Europe, Campus de Montegancedo, Edificio Cedint, Pozuelo de Alarcón 28223, Spain

J. Photon. Energy. 5(1), 057006 (Dec 29, 2014). doi:10.1117/1.JPE.5.057006
History: Received September 15, 2014; Accepted December 3, 2014
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Abstract.  Transmission-type concentrator photovoltaic (CPV) systems are a potential candidate to achieve high efficiency and low cost solar energy. The use of optical elements in these systems creates reflection losses of incoming solar energy that account for about 8% to 12% depending on the optical design. In order to reduce these losses, we have nanostructured the air/optical-elements’ interfaces by using plasma etching methods on the Fresnel lens made of poly(methyl methacrylate) (PMMA) and the homogenizer made of glass. On flat PMMA and glass substrates, transmittance enhancement measurements are in agreement with relative Jsc gains. The field test results using a CPV module with all textured optical-elements’ interfaces achieved 8.0% and 4.3% relative Jsc and efficiency gains, respectively, demonstrating the potential of this approach to tackle the reflection losses.

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© 2015 Society of Photo-Optical Instrumentation Engineers

Citation

Efrain Eduardo Tamayo Ruiz ; Kentaroh Watanabe ; Ryo Tamaki ; Takuya Hoshii ; Masakazu Sugiyama, et al.
"Plasma etching antireflection nanostructures on optical elements in concentrator photovoltaic systems", J. Photon. Energy. 5(1), 057006 (Dec 29, 2014). ; http://dx.doi.org/10.1117/1.JPE.5.057006


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