In this work, we present the enhancement of ultraviolet (UV) photodetection of Ag-ZnO thin film deposited by radio frequency magnetron sputtering. The surface morphological, optical, structural, and electrical properties of the deposited thin films were investigated by various characterization techniques. With this Ag-ZnO thin film structure and proper geometry of metal–semiconductor–metal (MSM) interdigitated structure design, photocurrent enhancement has been accomplished. MSM-photodetectors (PDs) using structures of Ag-ZnO gave a 30 times higher magnitude photocurrent at 340 nm of the wavelength. Plasmon-induced hot electrons contributed to improved spectral response to the UV region, while absorption and scattering effect enhanced broadband improvement to a response in the VIS–IR spectrum range. The improvement of Ag-ZnO PD in comparison with ZnO is attributed to the surface plasmon effect using Ag nanodisks. These results indicate that Ag-ZnO thin films can serve as excellent ultraviolet-PD and a very promising candidate for practical applications.