In the first major step, the Electromagnetic Waves, Frequency Domain module was used to calculate the 2-D EHP generation rate as a function of and . Normally incident monochromatic light sampled at 5-nm intervals on the -scale across the AM1.5G spectrum, 50% polarized and 50% polarized, was activated by the Periodic ports option at . Diffraction Order ports for diffraction orders were added. The inclusion of diffraction ports for even higher orders has little impact on the resulting EHP generation rate, predominantly due to strong absorption of shorter wavelength photons by , the majority of which are absorbed close to the surface of the device before they can be scattered. The boundaries parallel to the -axis have Floquet periodicity with the wavevector provided by the periodic ports. The region behind the back reflector was taken to be a perfectly matched layer. The semiconductor region was first meshed with a Mapped mesh with a 10-nm Distribution in both the - and -directions and then split into to a triangular distribution using the insert center points conversion. The back-reflector region was covered with an Extra fine, Delaunay, and Free Triangular mesh. Data for a spatial map of the computed EHP generation rate were stored in an external file.