Paper
9 September 1994 Optimization of the post-deposition oxidation of CDV-W films for preparation of WO3 as an electrochromic material
D. S. Gogova, K. A. Gesheva, G. I. Stoyanov
Author Affiliations +
Proceedings Volume 2255, Optical Materials Technology for Energy Efficiency and Solar Energy Conversion XIII; (1994) https://doi.org/10.1117/12.185375
Event: Optical Materials Technology for Energy Efficiency and Solar Energy Conversion XIII, 1994, Freiburg, Germany
Abstract
This paper deals with preparation of WO3 thin films and study of their optical and structural properties. Films were obtained using the following technological steps: first, the basic process is chemical vapor deposition (CVD) of W(CO)6. When pyrolitical decomposition at 400 degree(s)C of this material takes place in Ar atmosphere W thin films on quartz substrate were obtained. This step was followed by hydrogen reduction at 740 degree(s)C and by further oxidizing process. Some of the as-deposited films were directly submitted to oxidizing process without heating in H2 atmosphere. They are also WO3 structures and exhibit good transmittance. Using integrated sphere Perkin-Elmer spectrophotometer we measured the spectral transmittance and reflectance in the range of the solar spectrum. Films have high transmittance reaching in some samples 80% and reflectance in the range from 20 to 40%. We studied the structure of W oxide films using Reflection high energy electron diffraction (RHEED) method. The d-spacing values show that as-prepared films are WO3 structures.
© (1994) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
D. S. Gogova, K. A. Gesheva, and G. I. Stoyanov "Optimization of the post-deposition oxidation of CDV-W films for preparation of WO3 as an electrochromic material", Proc. SPIE 2255, Optical Materials Technology for Energy Efficiency and Solar Energy Conversion XIII, (9 September 1994); https://doi.org/10.1117/12.185375
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Cited by 4 scholarly publications.
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KEYWORDS
Transmittance

Reflectivity

Chemical vapor deposition

Thin films

Oxides

Quartz

Argon

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