Constitutive law for the densification of fused silica with applications in polishing and microgrinding

John C. Lambropoulos; Tong Fang; Su Xu; Sheryl M. Gracewski

doi:10.1117/12.218433

8 September 1995 Constitutive law for the densification of fused silica with applications in polishing and microgrinding

John C. Lambropoulos, Tong Fang, Su Xu, Sheryl M. Gracewski

Author Affiliations +

Proceedings Volume 2536, Optical Manufacturing and Testing; (1995) https://doi.org/10.1117/12.218433
Event: SPIE's 1995 International Symposium on Optical Science, Engineering, and Instrumentation, 1995, San Diego, CA, United States

Abstract

We discuss a constitutive model describing the permanent densification of fused silica under large applied pressures and shear stresses. The constitutive law is assumed to be rate- independent, and uses a yield function coupling hydrostatic pressure and shear stress, a flow rule describing the evolution of permanent strains after initial densification, and a hardening rule describing the dependence of the incremental densification on the levels of applied stresses. The constitutive law accounts for multiaxial states of stress, since during polishing and grinding operations complex stress states occur in a thin surface layer due to the action of abrasive particles. Due to frictional and other abrasive forces, large shear stresses are present near the surface during manufacturing. We apply the constitutive law in estimating the extent of the densified layer during the mechanical interaction of an abrasive grain and a flat surface.

Citation Download Citation

John C. Lambropoulos, Tong Fang, Su Xu, and Sheryl M. Gracewski "Constitutive law for the densification of fused silica with applications in polishing and microgrinding", Proc. SPIE 2536, Optical Manufacturing and Testing, (8 September 1995); https://doi.org/10.1117/12.218433

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