Characterization of Shipley's positive deep-UV experimental resists: deblocking studies

James F. Cameron; Arturo J. Orellana; Martha M. Rajaratnam; Roger F. Sinta

doi:10.1117/12.241824

14 June 1996 Characterization of Shipley's positive deep-UV experimental resists: deblocking studies

James F. Cameron, Arturo J. Orellana, Martha M. Rajaratnam, Roger F. Sinta

Proceedings Volume 2724, Advances in Resist Technology and Processing XIII; (1996) https://doi.org/10.1117/12.241824
Event: SPIE's 1996 International Symposium on Microlithography, 1996, Santa Clara, CA, United States

Abstract

Characterization of the resist chemistry and related processes within several of Shipley's new experimental positive deep UV resists is reported. These resists are unique in that they function by a combination of acid catalyzed deprotection and conversion of a dissolution inhibiting photoacid generator. The resist chemistry is characterized in terms of deblocking efficiency, acid generating efficiency and changes in dissolution rate. In addition, a knowledge of both the deblocking and acid generating efficiency within these resists allowed the catalytic chain length and deprotection volume to be calculated for each resist.

Citation Download Citation

James F. Cameron, Arturo J. Orellana, Martha M. Rajaratnam, and Roger F. Sinta "Characterization of Shipley's positive deep-UV experimental resists: deblocking studies", Proc. SPIE 2724, Advances in Resist Technology and Processing XIII, (14 June 1996); https://doi.org/10.1117/12.241824

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