Single-shot excimer laser annealing: a new tool for poly-AMLCD combined with spectroscopic ellipsometry

Marc X. Stehle; Dorian Zahorski; Jean-Louis P. Stehle

doi:10.1117/12.270295

10 April 1997 Single-shot excimer laser annealing: a new tool for poly-AMLCD combined with spectroscopic ellipsometry

Marc X. Stehle, Dorian Zahorski, Jean-Louis P. Stehle

Proceedings Volume 3014, Active Matrix Liquid Crystal Displays Technology and Applications; (1997) https://doi.org/10.1117/12.270295
Event: Electronic Imaging '97, 1997, San Jose, CA, United States

Abstract

Historical background and present status of excimer laser annealing of amorphous silicon for poly-TFTs fabrication are presented. Scanning and single shot systems are compared both on the physical and economical aspects. Process optimization and process control using real time spectroscopic ellipsometry are also presented. Finally, some perspectives in the development of very high power excimer laser are also given.

Citation Download Citation

Marc X. Stehle, Dorian Zahorski, and Jean-Louis P. Stehle "Single-shot excimer laser annealing: a new tool for poly-AMLCD combined with spectroscopic ellipsometry", Proc. SPIE 3014, Active Matrix Liquid Crystal Displays Technology and Applications, (10 April 1997); https://doi.org/10.1117/12.270295

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