IR absorption of TiO2 thin films

Marius D. Stamate; G. I. Rusu; Ioan Vascan

doi:10.1117/12.312696

2 July 1998 IR absorption of TiO₂ thin films

Marius D. Stamate, G. I. Rusu, Ioan Vascan

Proceedings Volume 3405, ROMOPTO '97: Fifth Conference on Optics; (1998) https://doi.org/10.1117/12.312696
Event: ROMOPTO '97: Fifth Conference on Optics, 1997, Bucharest, Romania

Abstract

The titanium oxide films were deposited on glass by reactive sputtering system, in different oxygen partial pressure. In this paper we present the IR absorption of TiO_x thin films, deposited through a d.c. circular magnetron system. We found several common peaks of absorption located around 500 cm^-1, 530 cm^-1, 582 cm^-1, 638 cm^-1 and 800 cm^-1 that are corresponding to Ti- O_x links energy.

Citation Download Citation

Marius D. Stamate, G. I. Rusu, and Ioan Vascan "IR absorption of TiO₂ thin films", Proc. SPIE 3405, ROMOPTO '97: Fifth Conference on Optics, (2 July 1998); https://doi.org/10.1117/12.312696

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