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Low temperature metal catalyzed InP nanowires with diameters ranging from 50nm to 500nm using a single step
MOCVD process at 450°C on (111)-oriented silicon substrates have been synthesized. The diameter range is much
higher than the critical limit (~24nm for InP on silicon) reported by a recent theoretical work on coherent growth of
nanowire heterostructures. This article presents the results of our investigation to highlight the possible factors that lead
to the unusually large diameters and help realize stable nanowire heterostructures in a highly lattice mismatched material
system. Our analysis finds dislocations formed at the interfacial plane of the heterostructure due to high lattice mismatch
is the most influential factor contributing to very large diameters. We have simulation results which indicate that each
added pair of orthogonal dislocation lines at the interfacial plane between InP and silicon supports ~12nm increase in the
nanowire diameter. A maximum nanowire density of ~5×108 cm-2 is estimated with growth rates ranging from 0.1
µm/min for the shortest nanowires and 10 μm/min for the longest ones.
Ataur R. Sarkar,Ibrahim Kimukin,Christopher W. Edgar,Sung Soo Yi,Christoph Mitterbauer,Nigel Browning, andM. Saif Islam
"Growth kinetics of InP nanowires heteroepitaxially grown on a silicon surface", Proc. SPIE 6768, Nanomaterials Synthesis, Interfacing, and Integrating in Devices, Circuits, and Systems II, 676804 (11 October 2007); https://doi.org/10.1117/12.738469
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Ataur R. Sarkar, Ibrahim Kimukin, Christopher W. Edgar, Sung Soo Yi, Christoph Mitterbauer, Nigel Browning, M. Saif Islam, "Growth kinetics of InP nanowires heteroepitaxially grown on a silicon surface," Proc. SPIE 6768, Nanomaterials Synthesis, Interfacing, and Integrating in Devices, Circuits, and Systems II, 676804 (11 October 2007); https://doi.org/10.1117/12.738469