Paper
16 December 2013 Super capacitance properties of SnO2 coated nickel/silicon microchannel plates
Keshuang Hui, Yiping Zhu, Shaohui Xu, Lianwei Wang, Paul K. Chu
Author Affiliations +
Proceedings Volume 9068, Eighth International Conference on Thin Film Physics and Applications; 90681P (2013) https://doi.org/10.1117/12.2053840
Event: Eighth International Conference on Thin Film Physics and Applications (TFPA13), 2013, Shanghai, China
Abstract
Supercapacitor is achieved by combining tin oxide with three dimensional silicon microchannel plates (Si-MCPs) deposited with nickel film. Electro deposition is applied to deposit the tin oxide on the Ni/Si-MCPs structure followed by sintering at 450°C. The structure and morphology of the samples are characterized by X-ray diffraction (XRD) and scanning electron microscopy (SEM). The electrochemical properties are investigated in 1 M Na2SO4 solution by cyclic voltammetry, galvanostatic charging-discharging, and electrochemical impedance spectroscopy. The highest specific capacitance of 0.814 F/cm2 (171.37 F/g) is achieved from the sample deposited for 2 h followed by sintering for 2 h.
© (2013) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Keshuang Hui, Yiping Zhu, Shaohui Xu, Lianwei Wang, and Paul K. Chu "Super capacitance properties of SnO2 coated nickel/silicon microchannel plates", Proc. SPIE 9068, Eighth International Conference on Thin Film Physics and Applications, 90681P (16 December 2013); https://doi.org/10.1117/12.2053840
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KEYWORDS
Capacitance

Electrodes

Oxides

Scanning electron microscopy

Tin

Microchannel plates

Resistance

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