Damage to inorganic materials illuminated by focused beam of x-ray free-electron laser radiation

Takahisa Koyama; Hirokatsu Yumoto; Kensuke Tono; Tadashi Togashi; Yuichi Inubushi; Tetsuo Katayama; Jangwoo Kim; Satoshi Matsuyama; Makina Yabashi; Kazuto Yamauchi; Haruhiko Ohashi

doi:10.1117/12.2182778

12 May 2015 Damage to inorganic materials illuminated by focused beam of x-ray free-electron laser radiation

Takahisa Koyama, Hirokatsu Yumoto, Kensuke Tono, Tadashi Togashi, Yuichi Inubushi, Tetsuo Katayama, Jangwoo Kim, Satoshi Matsuyama, Makina Yabashi, Kazuto Yamauchi, Haruhiko Ohashi

Author Affiliations +

Proceedings Volume 9511, Damage to VUV, EUV, and X-ray Optics V; 951107 (2015) https://doi.org/10.1117/12.2182778
Event: SPIE Optics + Optoelectronics, 2015, Prague, Czech Republic

Abstract

X-ray free-electron lasers (XFELs) that utilize intense and ultra-short pulse X-rays may damage optical elements. We investigated the damage fluence thresholds of optical materials by using an XFEL focusing beam that had a power density sufficient to induce ablation phenomena. The 1 μm focusing beams with 5.5 keV and/or 10 keV photon energies were produced at the XFEL facility SACLA (SPring-8 Angstrom Compact free electron LAser). Test samples were irradiated with the focusing beams under normal and/or grazing incidence conditions. The samples were uncoated Si, synthetic silica glass (SiO₂), and metal (Rh, Pt)-coated substrates, which are often used as X-ray mirror materials.

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Takahisa Koyama, Hirokatsu Yumoto, Kensuke Tono, Tadashi Togashi, Yuichi Inubushi, Tetsuo Katayama, Jangwoo Kim, Satoshi Matsuyama, Makina Yabashi, Kazuto Yamauchi, and Haruhiko Ohashi "Damage to inorganic materials illuminated by focused beam of x-ray free-electron laser radiation", Proc. SPIE 9511, Damage to VUV, EUV, and X-ray Optics V, 951107 (12 May 2015); https://doi.org/10.1117/12.2182778

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