Paper
26 February 2016 Enhancement of indium incorporation to InGaN MQWs on AlN/GaN periodic multilayers
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Abstract
The effect of compressive strain in buffer layer on strain relaxation and indium incorporation in InGaN multi-quantum wells (MQWs) is studied for two sets of samples grown side by side on both relaxed GaN layers and strained 10-pairs of AlN/GaN periodic multilayers. The 14-nm AlN layers were utilized in both multilayers, while GaN thickness was 4.5 and 2.5 nm in the first and the second set, respectively. The obtained results for the InGaN active layers on relaxed GaN and AlN/GaN periodic multilayers indicate enhanced indium incorporation for more relaxed InGaN active layers providing a variety of emission colors from purple to green.
© (2016) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Morteza Monavarian, Shopan Hafiz, Saikat Das, Natalia Izyumskaya, Ümit Özgür, Hadis Morkoç, and Vitaliy Avrutin "Enhancement of indium incorporation to InGaN MQWs on AlN/GaN periodic multilayers", Proc. SPIE 9748, Gallium Nitride Materials and Devices XI, 974825 (26 February 2016); https://doi.org/10.1117/12.2213777
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Cited by 2 scholarly publications.
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KEYWORDS
Gallium nitride

Indium gallium nitride

Indium

Aluminum nitride

Quantum efficiency

Indium nitride

Luminescence

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