Material analysis techniques used to drive down in-situ mask contamination sources

Harm Dillen; Gerard Rebel; Jennifer Massier; Dominika Grodzinka; Richard J. Bruls

doi:10.1117/12.2220400

25 March 2016 Material analysis techniques used to drive down in-situ mask contamination sources

Harm Dillen, Gerard Rebel, Jennifer Massier, Dominika Grodzinka, Richard J. Bruls

Proceedings Volume 9778, Metrology, Inspection, and Process Control for Microlithography XXX; 97781N (2016) https://doi.org/10.1117/12.2220400
Event: SPIE Advanced Lithography, 2016, San Jose, California, United States

Abstract

Using SEM-EDS analysis on small (< 200 nm) particles is challenging, especially on a substrate with multiple background elements present. We will show a methodology combining three techniques to get the most information out of small particles. This method combines low energy EDS with a nontraditional approach to improve statistics in EDS and elemental mapping. This methodology is required for ASML’s EUV platform, the NXE scanner to continue system improvement for a system showing already low defect count. The poor particle statistics on particle defects lead to a limited amount of particles available for diagnostics, which implies that all information on particle characteristics should be used for diagnostics.

Citation Download Citation

Harm Dillen, Gerard Rebel, Jennifer Massier, Dominika Grodzinka, and Richard J. Bruls "Material analysis techniques used to drive down in-situ mask contamination sources", Proc. SPIE 9778, Metrology, Inspection, and Process Control for Microlithography XXX, 97781N (25 March 2016); https://doi.org/10.1117/12.2220400

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