CyberOptics will be demonstrating the Airborne Particle Sensor™ (APSRQ) that quickly monitors, identifies and enables troubleshooting of airborne particles down to 0.14µm within process equipment and automated material handling systems. We will also be demonstrating the new In-Line Particle Sensor™ (IPS), an extension of the industry-leading APS sensing technology. The In-Line Particle Sensor with CyberSpectrum™ software detects particles in gas and vacuum lines 24/7 in semiconductor process equipment. The IPS quickly identifies, monitors and enables troubleshooting of particles down to 0.1μm. CyberOptics’ ReticleSense® Auto Multi Sensor™ (AMSR) measure leveling, vibration, and relative humidity (RH) in an all-in-one wireless real-time device. The AMSR can capture multiple measurements in all locations – providing yet another way to increase yield and reduce downtime in semiconductor environments.

Semiconductors have been a game changer in transforming electronics - in making devices compact and powerful over the years. Almost everything we touch and interact with today contains microchips. What role do we play in making this a reality?

The ULTRA specifically addresses the production of mature semiconductor photomasks. It provides an economical mask writer solution with all the features you require for high throughput, high precision and structure uniformity, and extremely accurate alignment. With its modern, compact build, you can easily incorporate the system into an existing mask shop infrastructure. Mature photomasks continue to be a vital component in semiconductor device fabrication, being used in power management, microcontrollers, LED lighting, the IOT, MEMS, the automotive industry, to name but a few. The ULTRA serves this market with structure sizes down to 500 nm and write speeds up to 325 mm2 or 580 mm2 per minute depending on write mode, while featuring excellent values for CD, image quality, overlay, and registration.

JSR developed family of photoresist, topcoats, underlayer materials and process chemicals for semiconductor manufacturing. JSR’s high performance lithography materials are utilized in various critical and non-critical lithography applications. JSR underlayer materials are key enabler of complex patterning schemes at advanced technology node. JSR is also a leader in process chemicals solutions including advanced cleans technology, materials for packaging and CMP materials. Our process materials solutions are essential part of advance semiconductor manufacturing.

We will introduce the latest results for etching of slanted relief grating (SRG) used as in- and out-coupling gratings in waveguides for augmented or mixed reality devices. The smaller input grating diffracts light coming from a display into the waveguide. At the out-coupler grating, light is diffracted in direction of the viewer. The geometrical dimension is below the wavelength of the light. Different approaches for the design of coupling gratings exist. One type is the so called SRG, which has a higher coupling efficiency compared to other types. For SRG, tilted trenches are etched in the waveguide, which is typically a plate made of a high refractive index material. The manufacturing challenges are the control of etching depth, slant angle and bottom angle. We will introduce a reactive ion beam milling tool for manufacturing of those gratings in mass production. We will give examples how to vary process parameters in order to control the grating geometry.