Prototype photomasksâ€"a low-cost alternative

Gary M. Bang

doi:10.1117/12.957193

17 July 1979 Prototype photomasksâ€"a low-cost alternative

Gary M. Bang

Proceedings Volume 0174, Developments in Semiconductor Microlithography IV; (1979) https://doi.org/10.1117/12.957193
Event: Developments in Semiconductor Microlithography IV, 1979, San Jose, United States

Abstract

This paper describes a low cost camera system which may be constructed by the user to develop prototype circuit masks in a minimum of time and at the lowest possible cost. The camera elements are standard Hasselblad units, the materials are commercially available and all processing chemicals are from Kodak. Its construction was primarily for new circuit evaluation but has proven adaptable to short production runs.

Citation Download Citation

Gary M. Bang "Prototype photomasksâ€"a low-cost alternative", Proc. SPIE 0174, Developments in Semiconductor Microlithography IV, (17 July 1979); https://doi.org/10.1117/12.957193

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