Laser Fabrication Of Photomasks For Hybrid Circuits

Robert T. Crowley

doi:10.1117/12.956408

7 July 1986 Laser Fabrication Of Photomasks For Hybrid Circuits

Robert T. Crowley

Proceedings Volume 0611, Laser Processing of Semiconductors & Hybrids; (1986) https://doi.org/10.1117/12.956408
Event: O-E/LASE'86 Symposium, 1986, Los Angeles, CA, United States

Abstract

This paper describes a technique for generating photomasks for hybrid circuits using a laser resistor trimming system. Photomasks can be generated by two separate techniques: micromachining a thin opaque film on a transparent substrate with a Nd:YAG laser, or exposing a photoresist covered blank photomask with an argon ion laser.

Citation Download Citation

Robert T. Crowley "Laser Fabrication Of Photomasks For Hybrid Circuits", Proc. SPIE 0611, Laser Processing of Semiconductors & Hybrids, (7 July 1986); https://doi.org/10.1117/12.956408

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available