Paper
20 April 1987 Growth Of ZnSe On GaAs Epitaxial Layers In A Dual Chamber Molecular Beam Epitaxy System
M. C. Tamargo, J. L. de Miguel, R. E. Nahory, B. J. Skromme
Author Affiliations +
Proceedings Volume 0796, Growth of Compound Semiconductors; (1987) https://doi.org/10.1117/12.941006
Event: Advances in Semiconductors and Semiconductor Structures, 1987, Bay Point, FL, United States
Abstract
We have grown ZnSe epitaxial layers on GaAs bulk substrates and on GaAs epitaxial layers by molecular beam epitaxy (MBE). A dual chamber MBE system was used which enabled the growth of the GaAs/ZnSe heterostructure completely in-situ. Examination of the initial stages of growth using RHEED indicates a much improved interface when ZnSe is grown over a GaAs epitaxial layer.
© (1987) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
M. C. Tamargo, J. L. de Miguel, R. E. Nahory, and B. J. Skromme "Growth Of ZnSe On GaAs Epitaxial Layers In A Dual Chamber Molecular Beam Epitaxy System", Proc. SPIE 0796, Growth of Compound Semiconductors, (20 April 1987); https://doi.org/10.1117/12.941006
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KEYWORDS
Gallium arsenide

Interfaces

Molecular beam epitaxy

Heterojunctions

Contamination

Luminescence

Oxides

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