Preparation Of Multilayered X-Ray Photoabsorption Targets

John W Weed

doi:10.1117/12.945489

11 July 1988 Preparation Of Multilayered X-Ray Photoabsorption Targets

John W Weed

Proceedings Volume 0911, X-Ray and Vacuum Ultraviolet Interaction Data Bases, Calculations, and Measurements; (1988) https://doi.org/10.1117/12.945489
Event: 1988 Los Angeles Symposium: O-E/LASE '88, 1988, Los Angeles, CA, United States

Abstract

Free standing targets, were produced to measure the sub-keV photoabsorption cross section. of numerous elements. The targets, were fabricated with a computer' controlled, magnetron sputter deposition. system. The targets are structured of multiple layers of a given element interspersed with layers of carbon. The purpose of the multi:layering is twofold: to improve the mechanical strength and to protect the given element from exposure to the atmosphere, using the outermost C layers as a seal. The targets are 1.9 cm in diameter' and their thicknesses, range from 160 nm to 4000 nm depending upon the element selected for the given. experiment. The total thickness of the C layers in each target is a maximum of 200 nm. The first and. last C layers (the sealing layers) are 50 nm thick and the remaining C is divided among the interspersed layers. Multilayer targets were successfully produced in which the given element was either Al, Ti, V, C7 Cr, Ni, Cu, Si, or Au. Areal density. and Rutherford backscatter measurements were performed. to accurately establish the total amount of the deposited. elements.

Citation Download Citation

John W Weed "Preparation Of Multilayered X-Ray Photoabsorption Targets", Proc. SPIE 0911, X-Ray and Vacuum Ultraviolet Interaction Data Bases, Calculations, and Measurements, (11 July 1988); https://doi.org/10.1117/12.945489

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