Background pressure effects on EUV source efficiency and produced debris characteristics

Tatyana Sizyuk

doi:10.1117/12.2258089

27 March 2017 Background pressure effects on EUV source efficiency and produced debris characteristics

Tatyana Sizyuk

Proceedings Volume 10143, Extreme Ultraviolet (EUV) Lithography VIII; 101432J (2017) https://doi.org/10.1117/12.2258089
Event: SPIE Advanced Lithography, 2017, San Jose, California, United States

Abstract

The cost of future computer chips, among other things, will depend on the performance of EUV sources and on the duration of the efficient operation and lifetime of nanolithography devices. While the efficiency of the sources is continuously being improved, their operational cycle is still highly restricted due to optical mirrors degradation as well as necessity of cleaning chamber environment and components.

One of the potential problems of EUV sources for high volume manufacture (HVM) regimes can be related to the contamination of chamber environment by products of preceding laser pulse/droplet interactions. Implementation of high, 100 kHz and higher, repetition rate of devices for Sn droplets and laser pulses generation can cause high accumulation of tin in the chamber in the form of vapor/clusters.

Possible tin accumulation in the chamber in dependence on laser parameters and mitigation system efficiency was evaluated. Then, the effects of various pressures of tin vapor on the CO₂ and Nd:YAG laser beams propagation and on the size, the intensity, and the efficiency of EUV sources produced were studied.

Citation Download Citation

Tatyana Sizyuk "Background pressure effects on EUV source efficiency and produced debris characteristics", Proc. SPIE 10143, Extreme Ultraviolet (EUV) Lithography VIII, 101432J (27 March 2017); https://doi.org/10.1117/12.2258089

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KEYWORDS

Extreme ultraviolet

Gas lasers

Carbon monoxide

Plasma

Protactinium

Nd:YAG lasers

Photons

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