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1 July 1994 Benchmark procedures for CD measurement system evaluation
Kevin M. Monahan
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Proceedings Volume 10274, Handbook of Critical Dimension Metrology and Process Control: A Critical Review; 1027403 (1994) https://doi.org/10.1117/12.187460
Event: Microelectronic Processing '93, 1993, Monterey, CA, United States
Abstract
The mathematical background underlying the science of critical dimension metrology is presented at a level suitable for the semiconductor process engineer with little direct experience in the field. Concomitant with this purpose, we make few assumptions and derive many of the concepts from first principles. Understanding the fundamentals provides a basis for further learning and a chart for navigating the sometimes murky waters of the literature. The process engineer can use this work profitably on its own or as a companion document to industrial1 and international standards2.
© (1994) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
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Kevin M. Monahan "Benchmark procedures for CD measurement system evaluation", Proc. SPIE 10274, Handbook of Critical Dimension Metrology and Process Control: A Critical Review, 1027403 (1 July 1994); https://doi.org/10.1117/12.187460
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KEYWORDS
Critical dimension metrology
Process engineering
Semiconductors
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