A portable pattern-based design technology co-optimization flow to reduce optical proximity correction run-time

Yi-Chieh Chen; Tsung-Han Li; Hung-Yu Lin; Kao-Tun Chen; Chun-Sheng Wu; Ya-Chieh Lai; Philippe Hurat

doi:10.1117/12.2297077

20 March 2018 A portable pattern-based design technology co-optimization flow to reduce optical proximity correction run-time

Yi-Chieh Chen, Tsung-Han Li, Hung-Yu Lin, Kao-Tun Chen, Chun-Sheng Wu, Ya-Chieh Lai, Philippe Hurat

Author Affiliations +

Proceedings Volume 10588, Design-Process-Technology Co-optimization for Manufacturability XII; 1058810 (2018) https://doi.org/10.1117/12.2297077
Event: SPIE Advanced Lithography, 2018, San Jose, California, United States

Abstract

Along with process improvement and integrated circuit (IC) design complexity increased, failure rate caused by optical getting higher in the semiconductor manufacture. In order to enhance chip quality, optical proximity correction (OPC) plays an indispensable rule in the manufacture industry. However, OPC, includes model creation, correction, simulation and verification, is a bottleneck from design to manufacture due to the multiple iterations and advanced physical behavior description in math. Thus, this paper presented a pattern-based design technology co-optimization (PB-DTCO) flow in cooperation with OPC to find out patterns which will negatively affect the yield and fixed it automatically in advance to reduce the run-time in OPC operation.

PB-DTCO flow can generate plenty of test patterns for model creation and yield gaining, classify candidate patterns systematically and furthermore build up bank includes pairs of match and optimization patterns quickly. Those banks can be used for hotspot fixing, layout optimization and also be referenced for the next technology node. Therefore, the combination of PB-DTCO flow with OPC not only benefits for reducing the time-to-market but also flexible and can be easily adapted to diversity OPC flow.

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Yi-Chieh Chen, Tsung-Han Li, Hung-Yu Lin, Kao-Tun Chen, Chun-Sheng Wu, Ya-Chieh Lai, and Philippe Hurat "A portable pattern-based design technology co-optimization flow to reduce optical proximity correction run-time", Proc. SPIE 10588, Design-Process-Technology Co-optimization for Manufacturability XII, 1058810 (20 March 2018); https://doi.org/10.1117/12.2297077

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KEYWORDS

Optical proximity correction

Integrated circuit design

Optics manufacturing

Design for manufacturability

Mathematical modeling

Electronics

Integrated circuits

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