Ultrashort pulse laser repair of photomasks for advanced lithography technologies

Tod Robinson; Jeff LeClaire

doi:10.1117/12.2501408

3 October 2018 Ultrashort pulse laser repair of photomasks for advanced lithography technologies

Tod Robinson, Jeff LeClaire

Proceedings Volume 10810, Photomask Technology 2018; 1081009 (2018) https://doi.org/10.1117/12.2501408
Event: SPIE Photomask Technology + Extreme Ultraviolet Lithography, 2018, Monterey, California, United States

Abstract

Deep ultraviolet (DUV) femtosecond laser repair of Cr binary and phase-shift photomasks is routine and well established over decades of practice. As Moore’s law progresses into sub-10 nm nodes, there is a necessary diversification of lithography technologies which can similarly benefit from the high-throughput, non-contact, contaminate-selective capabilities of ultrashort pulsed laser repair. These alternative lithography masks include extreme ultraviolet (EUV) TaN reflective and DUV SiN-based photomasks. Additionally, parametrically systematic studies are shown with intent to find the limits of selective, sub-resolution, removal of simulated soft defects in various patterns on DUV photomasks.

Conference Presentation

Citation Download Citation

Tod Robinson and Jeff LeClaire "Ultrashort pulse laser repair of photomasks for advanced lithography technologies", Proc. SPIE 10810, Photomask Technology 2018, 1081009 (3 October 2018); https://doi.org/10.1117/12.2501408

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available