Polyhydroxystyrene Carbonate Esters for High Sensitivity Photoresists Having Autodecomposition Temperatures > 160Â°

W. Brunsvold; W. Conley; D. Crockatt; N. Iwamoto

doi:10.1117/12.953048

30 January 1989 Polyhydroxystyrene Carbonate Esters for High Sensitivity Photoresists Having Autodecomposition Temperatures > 160°

W. Brunsvold, W. Conley, D. Crockatt, N. Iwamoto

Author Affiliations +

Proceedings Volume 1086, Advances in Resist Technology and Processing VI; (1989) https://doi.org/10.1117/12.953048
Event: 1989 Santa Clara Symposium on Microlithography, 1989, San Jose, CA, United States

Abstract

There are particular polymeric materials having acid labile groups pendant to the polymer backbone which can be used to produce resist structures having autodecomposition temperatures greater than 160°C. The increase in autodecomposition temperature of the resist is achieved by selecting acid labile groups which upon acid catalyzed deprotection generate less stable intermediate carbonium ions than the t-butyl carbonium ion. Acid labile groups that provide increased autodecomposition stability include those capable of forming secondary aliphatic and deactivated secondary benzylic carbonium ion intermediates. There must be a hydrogen on a carbon adjacent to the carbonium ion in order for elimination of an alkene and a proton to occur and continue the chemical amplification process. The acid labile pendant groups can be part of a polystyrene homopolymer or part of copolymers containing styrene and maleimide units.

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W. Brunsvold, W. Conley, D. Crockatt, and N. Iwamoto "Polyhydroxystyrene Carbonate Esters for High Sensitivity Photoresists Having Autodecomposition Temperatures > 160°", Proc. SPIE 1086, Advances in Resist Technology and Processing VI, (30 January 1989); https://doi.org/10.1117/12.953048

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