An Analysis Of Electron Beam Registration Capabilities By Electrical Measurement Methods

James P. Rominger

doi:10.1117/12.953083

19 July 1989 An Analysis Of Electron Beam Registration Capabilities By Electrical Measurement Methods

James P. Rominger

Proceedings Volume 1087, Integrated Circuit Metrology, Inspection, and Process Control III; (1989) https://doi.org/10.1117/12.953083
Event: 1989 Santa Clara Symposium on Microlithography, 1989, San Jose, CA, United States

Abstract

The use of electrical test patterns is examined as an analysis tool for electron beam (e-beam) pattern writing systems. The method makes extensive use of electrical linewidth measurement structures and pattern redundancy to determine pattern placement accuracy and fidelity on a single reticle layer. Significant improvement in resolution and repeatability over conventional optical based measurement systems is apparent. The quantity of data that was collected quickly and automatically provides an accurate and large-scale view of subtle distortions caused by both the e-beam and reticle processing.

Citation Download Citation

James P. Rominger "An Analysis Of Electron Beam Registration Capabilities By Electrical Measurement Methods", Proc. SPIE 1087, Integrated Circuit Metrology, Inspection, and Process Control III, (19 July 1989); https://doi.org/10.1117/12.953083

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