Statistically Comparing Three Optical Cd Measurement Systems

David A. Acree; Chen Lee

doi:10.1117/12.953111

19 July 1989 Statistically Comparing Three Optical Cd Measurement Systems

David A. Acree, Chen Lee

Proceedings Volume 1087, Integrated Circuit Metrology, Inspection, and Process Control III; (1989) https://doi.org/10.1117/12.953111
Event: 1989 Santa Clara Symposium on Microlithography, 1989, San Jose, CA, United States

Abstract

The rapid technological change in the VLSI industry has resulted in a constant upgrading of measurement equipment. One question to be asked is whether the upgrades recommended really improve the measurement system. Precise measurement equipment is one of the most important components in the next generation of VLSI technology. A systematic approach to measurement equipment upgrades in one micron technology can save much grief and remove uncertainty. In order to compare three optical CD measurement systems simultaneously, a statistically designed systematic approach was employed. The major contributors of variation were identified and quantified. The precision of each optical CD system was then compared. Findings from the study showed the upgraded system reduced variability associated with machine repeatability by a third, but only reduced overall measurement variation by a tenth. The same methods used here can apply in most cases where one piece of equipment is evaluated or several are compared. Vendor claims can be easily tested through the approach described. Reductions in measurement variation associated with an upgrade can be actually quantified allowing management to weigh benefits against costs.

Citation Download Citation

David A. Acree and Chen Lee "Statistically Comparing Three Optical Cd Measurement Systems", Proc. SPIE 1087, Integrated Circuit Metrology, Inspection, and Process Control III, (19 July 1989); https://doi.org/10.1117/12.953111

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