Polishing pad aging studies on computer controlled optical surfacing finishing for large-scale sapphire optical window

Liang Lv; Heng Zhu; Xiang He

doi:10.1117/12.2524350

10 May 2019 Polishing pad aging studies on computer controlled optical surfacing finishing for large-scale sapphire optical window

Liang Lv, Heng Zhu, Xiang He

Author Affiliations +

Proceedings Volume 11068, Second Symposium on Novel Technology of X-Ray Imaging; 1106819 (2019) https://doi.org/10.1117/12.2524350
Event: Second Symposium on Novel Technology of X-Ray Imaging, 2018, Hefei, China

Abstract

Polishing pad becomes aging after finishing for a while, by reason of friction and wear, or polishing particles deposition, which will reduce polishing effects, increase polishing effects and make a low polishing quality. When the ultra-hardness of sapphire material needs high pressure and high rotate speed parameters, which will accelerate aging of polishing pad. When large scale sapphire optical window is finished by computer controlled optical surfacing (CCOS) method, the polishing pad aging problem is an important confinement factor for high quality of polishing. In this paper, we confirmed the stable polishing period and aging time node of pitch pad and polyurethane pad by polishing experiments. For pitch pad, time aging nodes are between 50min and 75min with polishing pressure 0.1Mpa and 0.2Mpa and between 25min and 50min with polishing pressure 0.4Mpa. For polyurethane pad, the time aging nodes are over 75min with polishing pressure 0.1Mpa and 0.2Mpa and between 50min and 75min with polishing pressure 0.4Mpa. The aging time of polyurethane pad is later than that of pitch pad. Increasing polishing pressure will help increase material removal rate, but will accelerate aging of polishing pad

Citation Download Citation

Liang Lv, Heng Zhu, and Xiang He "Polishing pad aging studies on computer controlled optical surfacing finishing for large-scale sapphire optical window", Proc. SPIE 11068, Second Symposium on Novel Technology of X-Ray Imaging, 1106819 (10 May 2019); https://doi.org/10.1117/12.2524350

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