Requirements of data technology for EUV photomask

Jin Choi; Jonggul Doh; Minah Kim; Chan Uk Jeon

doi:10.1117/12.2538411

26 September 2019 Requirements of data technology for EUV photomask

Jin Choi, Jonggul Doh, Minah Kim, Chan Uk Jeon

Author Affiliations +

Proceedings Volume 11148, Photomask Technology 2019; 111480F (2019) https://doi.org/10.1117/12.2538411
Event: SPIE Photomask Technology + EUV Lithography, 2019, Monterey, California, United States

Abstract

Data technology for data handling, correction, and verification has become the essential technology of photomask. By the shrinkage of device pitch and the development of lithography technology, the data volume of photomask has been increased continuously and the correction and verification technology based on design data has an important role to meet the target of patterning quality. Especially, because EUV lithography makes single patterning possible, the decrease of device pitch rises to the challenge on the data technology for EUV photomask. Furthermore, the multi-beam mask writer which enables dose modulation for each pixel requires fundamental changes such as data format, data flow, and correction algorithm. Here, we will discuss about 7 kinds of data technologies and one proposal for the era of EUV lithography.

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Jin Choi, Jonggul Doh, Minah Kim, and Chan Uk Jeon "Requirements of data technology for EUV photomask", Proc. SPIE 11148, Photomask Technology 2019, 111480F (26 September 2019); https://doi.org/10.1117/12.2538411

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