Compact resist model using single convolution kernel

Taiki Kimura; Tetsuaki Matsunawa; Shoji Mimotogi

doi:10.1117/12.2551859

23 March 2020 Compact resist model using single convolution kernel

Taiki Kimura, Tetsuaki Matsunawa, Shoji Mimotogi

Author Affiliations +

Proceedings Volume 11327, Optical Microlithography XXXIII; 113270H (2020) https://doi.org/10.1117/12.2551859
Event: SPIE Advanced Lithography, 2020, San Jose, California, United States

Abstract

Lithography simulation is an essential technique for today's semiconductor manufacturing process. Although several rigorous models have been proposed, these methods are time-consuming. In order to calculate a full chip in realistic time, a fast and accurate resist model is essential. This paper proposes a new compact resist model using an arbitrary convolution kernel. The convolution formula can be described as a system of linear equations, therefore, we can determine the convolution kernel by solving the system of linear equations. However, it is hard to find the effective solution, because it is an ill-posed linear inverse problem due to the measurement constraints. Therefore, the key point of our method is how to solve the ill-posed linear inverse problem. In this paper, we explain the details and effectiveness of our method.

Conference Presentation

Citation Download Citation

Taiki Kimura, Tetsuaki Matsunawa, and Shoji Mimotogi "Compact resist model using single convolution kernel", Proc. SPIE 11327, Optical Microlithography XXXIII, 113270H (23 March 2020); https://doi.org/10.1117/12.2551859

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