Top-coats for scalable nano-manufacturing with high-χ block copolymers in lithographic applications

Xavier Chevalier; Cindy Gomes Correia; Gwenaelle Pound-Lana; Philippe Bézard; Matthieu Sérégé; Camille Petit-Etienne; Guillaume Gay; Gilles Cunge; Benjamin Cabannes-Boué; Célia Nicolet; Christophe Navarro; Ian Cayrefourcq; Marcus Müller; Georges Hadziioannou; Ilias Iliopoulos; Guillaume Fleury; Marc Zelsmann

doi:10.1117/12.2583717

22 February 2021 Top-coats for scalable nano-manufacturing with high-χ block copolymers in lithographic applications

Xavier Chevalier, Cindy Gomes Correia, Gwenaelle Pound-Lana, Philippe Bézard, Matthieu Sérégé, Camille Petit-Etienne, Guillaume Gay, Gilles Cunge, Benjamin Cabannes-Boué, Célia Nicolet, Christophe Navarro, Ian Cayrefourcq, Marcus Müller, Georges Hadziioannou, Ilias Iliopoulos, Guillaume Fleury, Marc Zelsmann

Author Affiliations +

Proceedings Volume 11612, Advances in Patterning Materials and Processes XXXVIII; 116120O (2021) https://doi.org/10.1117/12.2583717
Event: SPIE Advanced Lithography, 2021, Online Only

Abstract

Results for the self-assembly of lamellar silicon-containing high-χ block copolymers (BCP) with innovative neutral top-coat design are presented. We demonstrate that these materials and associated processes are compatible with a standard lithographic process, and oriented toward a potential high volume manufacturing. We show that this dedicated technology is able to guarantee the stability and planarity of the stack even at elevated self-assembly bake temperatures, and opens new opportunity in the fields of 3D BCPs stacks. Finally, we show interesting results for the etch-transfer of a lamellar BCP in silicon.

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Xavier Chevalier, Cindy Gomes Correia, Gwenaelle Pound-Lana, Philippe Bézard, Matthieu Sérégé, Camille Petit-Etienne, Guillaume Gay, Gilles Cunge, Benjamin Cabannes-Boué, Célia Nicolet, Christophe Navarro, Ian Cayrefourcq, Marcus Müller, Georges Hadziioannou, Ilias Iliopoulos, Guillaume Fleury, and Marc Zelsmann "Top-coats for scalable nano-manufacturing with high-χ block copolymers in lithographic applications", Proc. SPIE 11612, Advances in Patterning Materials and Processes XXXVIII, 116120O (22 February 2021); https://doi.org/10.1117/12.2583717

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