Lithocell availability improvement through light source maintenance cycle improvement and optimization and its availability impact analysis for cutting-edge ArFi light source

Takehiko Tomonaga; Tukasa Hori; Daisuke Tei; Taku Yamazaki; Tommy Oga

doi:10.1117/12.2583755

22 February 2021 Lithocell availability improvement through light source maintenance cycle improvement and optimization and its availability impact analysis for cutting-edge ArFi light source

Takehiko Tomonaga, Tukasa Hori, Daisuke Tei, Taku Yamazaki, Tommy Oga

Author Affiliations +

Proceedings Volume 11613, Optical Microlithography XXXIV; 116130S (2021) https://doi.org/10.1117/12.2583755
Event: SPIE Advanced Lithography, 2021, Online Only

Conference Poster

Abstract

In recent years, semiconductor demands have been growing to support on-line activity. And the needs of productivity improvement amongst chipmaker is higher than ever. ArFi light source’s modules life shall be targeting to one year cycle, and light source’s availability is improving is subjected as push to the limit and demonstrating an improvement year over year. To improve wafer output efficiency more, we need to focus not only on module lifetime extension but focus on to lithocell availability improvement which enabled by the alignment with PM time slot of the other scanner’s sub modules or chipmaker’s production cycle requirement in multiple year scale. Given these facts, this paper discusses Availability Maximization software function as Availability Maximization which is supported by the lightsource’s module replacement cycle extension by introducing emerging technologies and maintenance time reduction and optimization to fit into lithocell PM slot. Therefore, it provides the highest tool availability to chipmaker HVM environment invented by Giagaphoton’s unique and comprehensive solution.

Conference Presentation

Citation Download Citation

Takehiko Tomonaga, Tukasa Hori, Daisuke Tei, Taku Yamazaki, and Tommy Oga "Lithocell availability improvement through light source maintenance cycle improvement and optimization and its availability impact analysis for cutting-edge ArFi light source", Proc. SPIE 11613, Optical Microlithography XXXIV, 116130S (22 February 2021); https://doi.org/10.1117/12.2583755

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

;

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE