Presentation
5 March 2021 Micro-via fabrication of glass material for semiconductor packaging by 248 nm excimer laser
Yasufumi Kawasuji, Akira Suwa, Yasuhiro Adachi, Masakazu Kobayashi, Kouji Kakizaki, Masakazu Washio
Author Affiliations +
Abstract
In this study, we are developing the process of glass ablation by 248nm excimer to make micro-via to the glass material. The interposer connects many pins between both sides electrically. Therefore, the micro-via to the glass substrate must be needed. However, the micro-via machining to the glass material is difficult because the glass is brittle material. We report microdrilling processability of less than 20um diameter for glass material using a 248nm excimer laser. We also report the investigation result of the dependence of the drilling rate and laser fluence and laser pulse width.
Conference Presentation
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Yasufumi Kawasuji, Akira Suwa, Yasuhiro Adachi, Masakazu Kobayashi, Kouji Kakizaki, and Masakazu Washio "Micro-via fabrication of glass material for semiconductor packaging by 248 nm excimer laser", Proc. SPIE 11673, Laser Applications in Microelectronic and Optoelectronic Manufacturing (LAMOM) XXVI, 116730E (5 March 2021); https://doi.org/10.1117/12.2578038
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KEYWORDS
Glasses

Semiconductors

Excimer lasers

Packaging

Semiconductor materials

Semiconducting wafers

Laser drilling

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