Development of a high-flux ion diode utilizing a surface flashover plasma

Steven L. Cartier

doi:10.1117/12.18586

1 April 1990 Development of a high-flux ion diode utilizing a surface flashover plasma

Steven L. Cartier

Proceedings Volume 1226, Intense Microwave and Particle Beams; (1990) https://doi.org/10.1117/12.18586
Event: OE/LASE '90, 1990, Los Angeles, CA, United States

Abstract

The possibility of using a dielectric-covered cathode in a pulsed magnetically insulated ion diode to produce high H ion fluxes is investigated. In this experiment an array of resistor-backed holes in a polypropylene substrate provides uniform prepulsed discharges over the cathode of an annular diode. Since the diode operates in a high vacuum differential pumping of the system is not needed and collisional losses of the ions are minimized. The ions evolve from the dielectric material on the cathode following prepulsed discharges and are extracted by applying a high-voltage pulse to the diode. The goal is to identify and understand the processes involved in generating high H ion fluxes. Preliminary measurements indicate that H ions can be produced with this method although the cathode is strongly affected by the presence of water. 1

Citation Download Citation

Steven L. Cartier "Development of a high-flux ion diode utilizing a surface flashover plasma", Proc. SPIE 1226, Intense Microwave and Particle Beams, (1 April 1990); https://doi.org/10.1117/12.18586

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