Automatic on-line wafer stepper calibration system

Martin A. van den Brink; Hans Franken; Stefan Wittekoek; Theo Fahner

doi:10.1117/12.20056

1 June 1990 Automatic on-line wafer stepper calibration system

Martin A. van den Brink, Hans Franken, Stefan Wittekoek, Theo Fahner

Author Affiliations +

Proceedings Volume 1261, Integrated Circuit Metrology, Inspection, and Process Control IV; (1990) https://doi.org/10.1117/12.20056
Event: Microlithography '90, 1990, San Jose, CA, United States

Abstract

This paper introduces a new wafer stepper on-line calibration sensor, the Image Sensor, which refers directly to the aerial reticle image at the exposure wavelength. This sensor system is integrated with other stepper metrology systems by a so-called Image Sensor fiducial plate, which interacts simultaneously with the aerial reticle image, the Image Sensor, the TTL alignment system and the focus sensor of the stepper. An integrated software package ensures on-line regular stepper calibration, eliminating dependance on environmental, process and time parameters. Unique in this concept is the direct measurement of the consequence of wavelength drift in excimer laser steppers by measuring the aerial image deformation at the exposure wavelength. This information is used as a direct feedback to the wavelength control of the laser. Initial results of this system are presented for both UV (365 nm) and DUV (248 nm) steppers.

Citation Download Citation

Martin A. van den Brink, Hans Franken, Stefan Wittekoek, and Theo Fahner "Automatic on-line wafer stepper calibration system", Proc. SPIE 1261, Integrated Circuit Metrology, Inspection, and Process Control IV, (1 June 1990); https://doi.org/10.1117/12.20056

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