Object contrast in the confocal microscope and applications to lithographic metrology

Kevin M. Monahan; Jozef P. H. Benschop

doi:10.1117/12.20034

1 June 1990 Object contrast in the confocal microscope and applications to lithographic metrology

Proceedings Volume 1261, Integrated Circuit Metrology, Inspection, and Process Control IV; (1990) https://doi.org/10.1117/12.20034
Event: Microlithography '90, 1990, San Jose, CA, United States

Abstract

We show that the focal planecontrast of the confocal scanning thser microscope can be used effectively to measure critical dimensions at the base ofsubmicrometer photoresist structures. The results, when compared with high-voltage SEM measurements, are found to be highly feature dependent; separate threshold optimizations are required for each case. A new criterion, incremental response, was introduced to aid in measurement system evaluation.

Citation Download Citation

Kevin M. Monahan and Jozef P. H. Benschop "Object contrast in the confocal microscope and applications to lithographic metrology", Proc. SPIE 1261, Integrated Circuit Metrology, Inspection, and Process Control IV, (1 June 1990); https://doi.org/10.1117/12.20034

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