Paper
12 October 2023 Meeting the maskmaking challenge: A technique to achieve rapid reticle writing independent of address size
Paul A. Warkentin, James A. Schoeffel
Author Affiliations +
Abstract
The drive toward ICs with increased speed, higher levels of integration, and lower power consumption, and the increased demand for ASICs have and will continue to define new challenges for the maskmaking industry. Maskmakers are being asked to produce increasing numbers of 5X reticles with ever shorter turnaround times. And, they are being asked to accomplish this with bigger pattern files, higher placement precision, and smaller address grids. This challenge is difficult to meet with electron beam systems. Bigger pattern files, higher placement precision, and smaller address grids increase reticle writing time, and the batch operation of e-beam systems and the relatively long e-beam resist processing sequence combine to further lengthen the turnaround time. This paper will describe the CORE-2000's data handling architecture and its unique writing strategy. The basic raster scan writing strategy of the CORE-2000 has been enhanced by image processing techniques commonly used in the graphics industry to allow 0.1 urn address data to be written without decreasing the system's throughput. The impact on turnaround time of the CORE-2000's serial process flow and optical resist processing will also be discussed.
© (2023) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Paul A. Warkentin and James A. Schoeffel "Meeting the maskmaking challenge: A technique to achieve rapid reticle writing independent of address size", Proc. SPIE 12811, Bay Area Chrome Users Society Symposium 1987, 1281102 (12 October 2023); https://doi.org/10.1117/12.3011925
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