Poster + Paper
10 April 2024 Metrology-class EUV light source based on quasi-continuous copper LPP
Seth L. Cousin, Feng Dong, Matt Hettermann, Dave Houser, Patrick Naulleau
Author Affiliations +
Conference Poster
Abstract
In this submission, we introduce the performance and attributes of our broadband EUV source, which is generated using a copper-based laser-produced plasma. This source is currently operational in EUV Tech’s HVM reflectometer and multi-angle reflectometer / scatterometry (ENK) tools.
© (2024) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Seth L. Cousin, Feng Dong, Matt Hettermann, Dave Houser, and Patrick Naulleau "Metrology-class EUV light source based on quasi-continuous copper LPP", Proc. SPIE 12953, Optical and EUV Nanolithography XXXVII, 129531D (10 April 2024); https://doi.org/10.1117/12.3012186
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KEYWORDS
Extreme ultraviolet

Copper

Metrology

Extreme ultraviolet lithography

Reflectometry

Laser systems engineering

Light sources

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