Advancing measurement science for microelectronics: CHIPS R&D metrology program

Marla Dowell

doi:10.1117/12.3018825

10 April 2024 Advancing measurement science for microelectronics: CHIPS R&D metrology program

Marla Dowell

Author Affiliations +

Proceedings Volume 12955, Metrology, Inspection, and Process Control XXXVIII; 129550I (2024) https://doi.org/10.1117/12.3018825
Event: SPIE Advanced Lithography + Patterning, 2024, San Jose, California, United States

Abstract

The CHIPS and Science Act of 2022 called for NIST to “carry out a microelectronics research program to enable advances and breakthroughs….that will accelerate the underlying R&D for metrology of next-generation microelectronics and ensure the competitiveness and leadership of the United States….”, NIST is leveraging its measurement science expertise, standards development contributions, and stakeholder engagement practices to address the highest priority metrology challenges identified across industry, academia, and government agencies. The program expands upon NIST’s strong track record of supporting the semiconductor technology and manufacturing ecosystem by developing, advancing, and deploying measurement technologies that are accurate, precise, and fit-for-purpose.

Conference Presentation

Citation Download Citation

Marla Dowell "Advancing measurement science for microelectronics: CHIPS R&D metrology program", Proc. SPIE 12955, Metrology, Inspection, and Process Control XXXVIII, 129550I (10 April 2024); https://doi.org/10.1117/12.3018825

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