Performance testing system for extreme ultraviolet lithography components

Wooram Kim; Eunseok Choe; Do-Yeon Hwang; Sangwoo Kang; Won Chegal; Jung-Hyung Kim

doi:10.1117/12.3033688

12 November 2024 Performance testing system for extreme ultraviolet lithography components

Wooram Kim, Eunseok Choe, Do-Yeon Hwang, Sangwoo Kang, Won Chegal, Jung-Hyung Kim

Author Affiliations +

Proceedings Volume 13215, International Conference on Extreme Ultraviolet Lithography 2024; 132150W (2024) https://doi.org/10.1117/12.3033688
Event: SPIE Photomask Technology + EUV Lithography, 2024, Monterey, California, United States

Abstract

With advances in cutting-edge IT technology, such as artificial intelligence and augmented reality, ultrafine lithography using extreme ultraviolet (EUV) sources has been important for high-volume manufacturing of high-performance chips. To implement EUV lithography, it is important to develop EUV components such as photoresists, pellicles, and reflective mirrors, and performance testing of them is essentially needed. In this work, a performance testing system for EUV components is introduced, and it consists of a Z-pinch EUV source, an optical system, and a sample test chamber. We focused on optical properties such as the emission spectrum of the Z-pinch EUV source and optical fluence on the surface of materials. A spectrometer was set to calibrate referred to a reference gas, source diagnosis. As monitoring the optical spectrum, optical power with a wavelength of 13.5nm was maximized by optimizing the parameters of DC pulse power, a repetition rate, and loss by absorption to the gases. As a result, the optical fluence reaches 30mJ/cm2. In conclusion, we configured a performance testing system for EUV lithography components, and it can be widely utilized to verify newly developed photoresists.

(2024) Published by SPIE. Downloading of the abstract is permitted for personal use only.

Citation Download Citation

Wooram Kim, Eunseok Choe, Do-Yeon Hwang, Sangwoo Kang, Won Chegal, and Jung-Hyung Kim "Performance testing system for extreme ultraviolet lithography components", Proc. SPIE 13215, International Conference on Extreme Ultraviolet Lithography 2024, 132150W (12 November 2024); https://doi.org/10.1117/12.3033688

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KEYWORDS

Extreme ultraviolet

Extreme ultraviolet lithography

EUV optics

Photoresist materials

Mirrors

Optical properties

Pellicles

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