Displacement talbot lithography: why does it work and why is it the next generation of photonic patterning?

Kelsey Wooley; Zhixin Wang; Stefan Rietmann; Harun Solak

doi:10.1117/12.3039307

13 November 2024 Displacement talbot lithography: why does it work and why is it the next generation of photonic patterning?

Kelsey Wooley, Zhixin Wang, Stefan Rietmann, Harun Solak

Author Affiliations +

Proceedings Volume 13216, Photomask Technology 2024; 132161D (2024) https://doi.org/10.1117/12.3039307
Event: SPIE Photomask Technology + EUV Lithography, 2024, Monterey, California, United States

Abstract

This presentation explores the optical principles and practical circumstances that make Displacement Talbot Lithography (DTL) technique one of the leading technology choices for manufacturing high-resolution periodic patterns, which find growing use especially in various photonics applications. DTL, characterized by its non-contact optical patterning, offers advantages including large, seamless exposure fields, large depth of focus, high-resolution capability and uniform, reproducible printing performance. In addition to easily forming simple patterns such as line/space gratings, we have recently shown through an inverse lithography approach to mask design, enabled by machine learning techniques, that DTL has the capability for printing complex shapes like 2D arrays of crosses. Eulitha provides DTL-based tools for manufacturing, ranging from single exposure research models to newly introduced step-and-repeat type tools for large size wafers (+300mm). Fast prototyping and demonstration capabilities provided through a newly expanded application demonstration laboratory help industrial users quickly explore suitability and realize prototypes.

Conference Presentation

Citation Download Citation

Kelsey Wooley, Zhixin Wang, Stefan Rietmann, and Harun Solak "Displacement talbot lithography: why does it work and why is it the next generation of photonic patterning?", Proc. SPIE 13216, Photomask Technology 2024, 132161D (13 November 2024); https://doi.org/10.1117/12.3039307

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