Poster + Paper
20 November 2024 Reducing mask process correction time with hybrid rule-based and model-based solution
Author Affiliations +
Conference Poster
Abstract
Model-based Mask Process Correction (MPC) is an effective method to ensure mask pattern fidelity, enhance mask feature resolution and improve mask Critical Dimension (CD) uniformity at advanced mask technology nodes. However, implementation of model-based MPC typically involves long cycle time of mask manufacturing. Rule-based MPC, on the other hand, has an advantage in the cycle time, but the accuracy normally cannot meet the specification. Therefore, improving MPC runtime without tolerating the accuracy is highly desired in the mask making process. A hybrid ruled-based and model-based MPC solution is introduced in this paper, which is aimed to maintain mask CD accuracy with reduced runtime. In this flow, a bias rule table is first automatically generated from a calibrated MPC model. The edges of the MPC target are then moved based on the rule table. The model-based MPC step is finally applied starting from the pre-moved edges, which gives fast convergence with minimum number of iterations. The mask correction accuracy and cycle time of this hybrid MPC flow is compared with full model-based MPC flow in detail.
(2024) Published by SPIE. Downloading of the abstract is permitted for personal use only.
Xuan Zhu, Chia-Wei Chang, Yongming Wen, Ao Chen, and Yu Zhu "Reducing mask process correction time with hybrid rule-based and model-based solution", Proc. SPIE 13216, Photomask Technology 2024, 1321624 (20 November 2024); https://doi.org/10.1117/12.3034092
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KEYWORDS
Model based design

Bias correction

Calibration

Data modeling

Manufacturing

Critical dimension metrology

Process modeling

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