Recent progress of multi-beam mask writer MBM-3000

Issei Aibara; Hiroshi Matsumoto; Jumpei Yasuda; Ken-ichi Yasui; Tomoo Motosugi; Hayato Kimura; Michihiro Kawaguchi; Yoshinori Kojima; Masato Saito; Noriaki Nakayamada

doi:10.1117/12.3028706

18 September 2024 Recent progress of multi-beam mask writer MBM-3000

Issei Aibara, Hiroshi Matsumoto, Jumpei Yasuda, Ken-ichi Yasui, Tomoo Motosugi, Hayato Kimura, Michihiro Kawaguchi, Yoshinori Kojima, Masato Saito, Noriaki Nakayamada

Author Affiliations +

Proceedings Volume 13273, 39th European Mask and Lithography Conference (EMLC 2024); 132730O (2024) https://doi.org/10.1117/12.3028706
Event: 39th European Mask and Lithography Conference (EMLC 2024), 2024, Grenoble, France

Abstract

The multi-beam mask writer MBM-3000, where beam current density increases to 3.6A/cm², the beam count doubles for faster writing speed, and beam size decreases from 16nm to 12nm for higher resolution, has been released since 2023 to support the N2 device technology node. We developed not only the optics with improved writing accuracy for reduction in the Coulomb interaction effects but also a new data path, and moreover introduced a new data format MBF2.1 for efficient handling of curve data. Writing time of MBM-3000 now becomes 10.5 hours when exposure dose is 200 μC/cm². Consequently, the system grows in power compared with previous series including MBM-2000 PLUS.

(2024) Published by SPIE. Downloading of the abstract is permitted for personal use only.

Citation Download Citation

Issei Aibara, Hiroshi Matsumoto, Jumpei Yasuda, Ken-ichi Yasui, Tomoo Motosugi, Hayato Kimura, Michihiro Kawaguchi, Yoshinori Kojima, Masato Saito, and Noriaki Nakayamada "Recent progress of multi-beam mask writer MBM-3000", Proc. SPIE 13273, 39th European Mask and Lithography Conference (EMLC 2024), 132730O (18 September 2024); https://doi.org/10.1117/12.3028706

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