Robust, sub-angstrom-level midspatial-frequency profilometry

Paul E. Glenn

doi:10.1117/12.22802

1 November 1990 Robust, sub-angstrom-level midspatial-frequency profilometry

Paul E. Glenn

Proceedings Volume 1333, Advanced Optical Manufacturing and Testing; (1990) https://doi.org/10.1117/12.22802
Event: 34th Annual International Technical Symposium on Optical and Optoelectronic Applied Science and Engineering, 1990, San Diego, CA, United States

Abstract

The paper indicates the emerging requirements for profilometry instruments for use in the fabrication and characterisation of modern optical systems. Important design principles are covered, together with some of the problems which can be experienced. Examples of a number of systems recently developed are given both stand alone systems and those which operate insitu to the machining process.

Citation Download Citation

Paul E. Glenn "Robust, sub-angstrom-level midspatial-frequency profilometry", Proc. SPIE 1333, Advanced Optical Manufacturing and Testing, (1 November 1990); https://doi.org/10.1117/12.22802

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