Inverse lithography with adaptive threshold regularization

Jiale Liu; Wenjing He; Shuya Deng; Wenhao Ding; Yuhang Wang; Yijiang Shen

doi:10.1117/12.3052339

10 December 2024 Inverse lithography with adaptive threshold regularization

Jiale Liu, Wenjing He, Shuya Deng, Wenhao Ding, Yuhang Wang, Yijiang Shen

Author Affiliations +

Proceedings Volume 13423, Eighth International Workshop on Advanced Patterning Solutions (IWAPS 2024); 1342309 (2024) https://doi.org/10.1117/12.3052339
Event: 8th International Workshop on Advanced Patterning Solutions (IWAPS 2024), 2024, Jiaxing, Zhejiang, China

Abstract

We introduce an inverse lithography framework where typical grayscale mask tone is penalized toward transparent and opaque transmissions compatible with existing mask writing. Threshold regularization featuring dynamic fine-tuned optimal thresholds for main feature and Sub-Resolution Assist Features (SRAFs) is incorporated into the optimization of lithographic image formation. The optimization flow preludes with the synthesis of a Continuous Transmission Mask (CTM) for the best pattern fidelity; then respective thresholds are applied to main feature and orders of SARF by including the regularization term into the mask synthesis flow where a warp function is devised for binarizing mask transmission with optimal thresholds. Simulations results demonstrate that the proposed approach effectively facilitates the pursuit of comparable lithographic imaging performance while maintaining design flexibility which is essential for both mask design and fabrication.

(2024) Published by SPIE. Downloading of the abstract is permitted for personal use only.

Citation Download Citation

Jiale Liu, Wenjing He, Shuya Deng, Wenhao Ding, Yuhang Wang, and Yijiang Shen "Inverse lithography with adaptive threshold regularization", Proc. SPIE 13423, Eighth International Workshop on Advanced Patterning Solutions (IWAPS 2024), 1342309 (10 December 2024); https://doi.org/10.1117/12.3052339

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