Multialkali photocathodes grown by molecular beam epitaxy technique

I. A. Dubovoi; A. S. Chernikov; Alexander M. Prokhorov; Mikhail Ya. Schelev; Victor N. Ushakov

doi:10.1117/12.24018

1 April 1991 Multialkali photocathodes grown by molecular beam epitaxy technique

I. A. Dubovoi, A. S. Chernikov, Alexander M. Prokhorov, Mikhail Ya. Schelev, Victor N. Ushakov

Author Affiliations +

Proceedings Volume 1358, 19th Intl Congress on High-Speed Photography and Photonics; (1991) https://doi.org/10.1117/12.24018
Event: 19th International Congress on High-Speed Photography and Photonics, 1990, Cambridge, United Kingdom

Abstract

A new technique of bialkali photocathodes growth by molecular beam epitaxy (MI3E) has been developed. The photocathode film was deposited onto the substrate from molecular beams produced by simultaneously operating molecular sources of Sb, Na and K. Thus suggested procedure is noticeably differed from the classical one. Growth rate was about 1 A/sec and complete cycle of photocathode fabrication was 15-20 minutes. A special ultra high vacuum (UHV) chamber for MBE of multialkali photocathodes has been designed. The chamber is a part of UHV system consisting of an analysis vessel supplied with Auger and ESCA electron spectrometer and low energy electron diffractometer (LEED), the MBE chamber itself and a chamber for cold sealing of photocathodes with device body through indium ring. The system gives a possibility to carry out investigations of multialkali photocathode physics and to produce commercial devices. Developed technique can be used for fabrication of vacuum devices including streak tubes.

Citation Download Citation

I. A. Dubovoi, A. S. Chernikov, Alexander M. Prokhorov, Mikhail Ya. Schelev, and Victor N. Ushakov "Multialkali photocathodes grown by molecular beam epitaxy technique", Proc. SPIE 1358, 19th Intl Congress on High-Speed Photography and Photonics, (1 April 1991); https://doi.org/10.1117/12.24018

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