A high temperature, plasma-assisted chemical vapor deposition system

R. M. Brusasco

doi:10.1117/12.2294453

1 November 1990 A high temperature, plasma-assisted chemical vapor deposition system

R. M. Brusasco

Proceedings Volume 1438, Laser-Induced Damage in Optical Materials 1989; 143818 (1990) https://doi.org/10.1117/12.2294453
Event: Laser-Induced Damage in Optical Materials 1989, 1989, Boulder, CO, United States

Abstract

We have designed and built a high-temperature, plasma-assisted, chemical vapor deposition system to deposit multilayer optical coatings of SiO2 and doped-SiO2 on flat substrates. The coater concept and design is an outgrowth of our recent work with Schott Glaswerke demonstrating the use of plasma assisted CVD to prepare very high damage threshold optical coatings. (That work is reported in a companion paper at this Symposium).

Citation Download Citation

R. M. Brusasco "A high temperature, plasma-assisted chemical vapor deposition system", Proc. SPIE 1438, Laser-Induced Damage in Optical Materials 1989, 143818 (1 November 1990); https://doi.org/10.1117/12.2294453

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