E-beam data compaction method for large-capacity mask ROM production

Toyomi Kanemaru; Takashi Nakajima; Tadanao Igarashi; Rika Masuda; Nobuyuki Orita

doi:10.1117/12.46755

1 March 1991 E-beam data compaction method for large-capacity mask ROM production

Toyomi Kanemaru, Takashi Nakajima, Tadanao Igarashi, Rika Masuda, Nobuyuki Orita

Proceedings Volume 1496, 10th Annual Symp on Microlithography; (1991) https://doi.org/10.1117/12.46755
Event: 10th Annual Symposium on Microlithography, 1990, Sunnyvale, CA, United States

Abstract

Mask ROMs are one of the most advanced devices commercially available today. 4 Mbit DRAMs are just coming to the market, where 32 Mbit and 64 Mbit Mask ROM products also are entering the market. The code mask of Mask ROM consists, of a random distribution of repeated cells on a constant grid, so it is difficult to use conventional e-beam data compaction techniques for the code mask level of a Mask ROM. As mask ROM capacity and their mask exposure data volumes increase, the e-beam data processing time for these devices also has increased even with enhanced computational speeds of new mainframe computers. To overcome this problem, we have adopted a new e-beam data compaction technique. With this ne technique of a data compaction, data conversion times on a mainframe computer (ACOS) are substantially shorted and data volume is reduced by as much as a factor of one hundred. Using this new data format, the data volume of a variable shaped vector scan e-beam exposure system became far smaller compared with a spot beam raster scan e-beam system.

Citation Download Citation

Toyomi Kanemaru, Takashi Nakajima, Tadanao Igarashi, Rika Masuda, and Nobuyuki Orita "E-beam data compaction method for large-capacity mask ROM production", Proc. SPIE 1496, 10th Annual Symp on Microlithography, (1 March 1991); https://doi.org/10.1117/12.46755

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