Establishment of new criterion aiding the control of antireflection coating semiconductor diodes

Yu Cun Lu; Da Yi Li; Jianguo Chen; Bin Luo

doi:10.1117/12.47234

1 November 1991 Establishment of new criterion aiding the control of antireflection coating semiconductor diodes

Yu Cun Lu, Da Yi Li, Jianguo Chen, Bin Luo

Proceedings Volume 1519, International Conference on Thin Film Physics and Applications; (1991) https://doi.org/10.1117/12.47234
Event: International Conference on Thin Film Physics and Applications, 1991, Shanghai, China

Abstract

The process of antireflector (AR) coating semiconductor diodes has been studied by employing the traveling-wave rate equations. As a result, a new criterion aiding the control of AR film deposition has been established. The agreement between theoretical predictions and experimental results is good.

Citation Download Citation

Yu Cun Lu, Da Yi Li, Jianguo Chen, and Bin Luo "Establishment of new criterion aiding the control of antireflection coating semiconductor diodes", Proc. SPIE 1519, International Conference on Thin Film Physics and Applications, (1 November 1991); https://doi.org/10.1117/12.47234

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