Chemical deposition of large-area silver sulphide films

S. S. Dhumure; C. D. Lokhande

doi:10.1117/12.57029

1 February 1992 Chemical deposition of large-area silver sulphide films

S. S. Dhumure, C. D. Lokhande

Proceedings Volume 1523, Conference on Physics and Technology of Semiconductor Devices and Integrated Circuits; (1992) https://doi.org/10.1117/12.57029
Event: Conference on Physics and Technology of Semiconductor Devices and Integrated Circuits, 1992, Madras, India

Abstract

In this paper, we report on the chemical deposition of a large area (approximately equals 50 cm²) of Ag₂S films from an acidic medium using thioacetamide as a sulpher source. The effect of deposition temperature from 8 to 55 degree(s)C was studied. The electrical resistivity microstructure and XRD of the films have studied. Photoelectrochemical cells showed that the films are n type and photoactive in nature.

Citation Download Citation

S. S. Dhumure and C. D. Lokhande "Chemical deposition of large-area silver sulphide films", Proc. SPIE 1523, Conference on Physics and Technology of Semiconductor Devices and Integrated Circuits, (1 February 1992); https://doi.org/10.1117/12.57029

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