Paper
1 October 1991 Ellipsometric measurement of far-infrared optical constants
Karl-Ludwig Barth
Author Affiliations +
Proceedings Volume 1576, 16th International Conference on Infrared and Millimeter Waves; 15760F (1991) https://doi.org/10.1117/12.2297728
Event: 16th International Conference on Infrared and Millimeter Waves, 1991, Lausanne, Switzerland
Abstract
Ellipsometry is based on exploiting the polarization transformation that occurs as a beam of polarized light is reflected from or transmitted through an interface or film. With this method optical constants can be determined very fast, very precisely and without further assumptions (no Kramers-Kronig analysis). We have developed a rotating analyzer ellipsometer for the far-infrared wavelength range from 30 to 1200 μm. Applications are in the characterization of semiconductors and also, together with a cryogenic reflection unit, of high-Tc superconductors.
© (1991) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Karl-Ludwig Barth "Ellipsometric measurement of far-infrared optical constants", Proc. SPIE 1576, 16th International Conference on Infrared and Millimeter Waves, 15760F (1 October 1991); https://doi.org/10.1117/12.2297728
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KEYWORDS
Optical testing

Dielectrics

Ellipsometry

Refractive index

Semiconductors

Silicon

Dielectric polarization

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