Scanning tunneling microscope to evaluate supersmooth surface roughness

Jingchi Yu; Lantian Hou; J. Wei; J. E. Yao; Jianlin Cao; Junyi Yu

doi:10.1117/12.130727

10 December 1992 Scanning tunneling microscope to evaluate supersmooth surface roughness

Jingchi Yu, Lantian Hou, J. Wei, J. E. Yao, Jianlin Cao, Junyi Yu

Proceedings Volume 1752, Current Developments in Optical Design and Optical Engineering II; (1992) https://doi.org/10.1117/12.130727
Event: San Diego '92, 1992, San Diego, CA, United States

Abstract

Our group has developed a surface roughness measuring system for supersmooth optics based on scanning tunneling microscopy techniques, which includes the assessment of two dimensional and three dimensional surface roughness parameters. The system has been applied to topographic mapping of superpolished Si wafer coated with single layer Mo film. The measuring precision of measured Rms, Ra and P-V value, if expressed with standards deviation (sigma) _s, is 0.06 nm, 0.05 nm and 0.19 nm, respectively, which has achieved atomic resolution.

Citation Download Citation

Jingchi Yu, Lantian Hou, J. Wei, J. E. Yao, Jianlin Cao, and Junyi Yu "Scanning tunneling microscope to evaluate supersmooth surface roughness", Proc. SPIE 1752, Current Developments in Optical Design and Optical Engineering II, (10 December 1992); https://doi.org/10.1117/12.130727

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